Tommi Kääriäinen,David Cameron,Marja-Leena Kääriäinen,Arthur's Atomic Layer Deposition: Principles, Characteristics, and PDF

By Tommi Kääriäinen,David Cameron,Marja-Leena Kääriäinen,Arthur Sherman

ISBN-10: 1118062779

ISBN-13: 9781118062777

because the first version used to be released in 2008, Atomic Layer Deposition (ALD) has emerged as a strong, and infrequently most popular, deposition know-how. the recent version of this groundbreaking monograph is the 1st textual content to study the topic of ALD comprehensively from a pragmatic standpoint. It covers ALD's program to microelectronics (MEMS) and nanotechnology; many very important new and rising purposes; thermal procedures for ALD development of nanometer thick motion pictures of semiconductors, oxides, metals and nitrides; and the formation of natural and hybrid materials.

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Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications by Tommi Kääriäinen,David Cameron,Marja-Leena Kääriäinen,Arthur Sherman


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